Index of /~bryan/papers2/curing

[ICO]NameLast modifiedSizeDescription

[PARENTDIR]Parent Directory  -  
[   ]All-optical patterning of azo polymer films.pdf2014-06-13 00:30 194K 
[   ]A quantitative study on the adhesion property of cured SU-8 on various metallic surfaces.pdf2013-11-27 13:50 324K 
[   ]A review of the optimisation of photopolymer materials for holographic data storage.pdf2013-10-09 12:36 2.0M 
[   ]A simple bonding process of SU-8 to glass to seal a microfluidic device.pdf2007-07-02 04:35 208K 
[   ]A water‐developable negative photoresist based on the photocrosslinking of N‐phenylamide groups with reduced environmental impact.pdf2006-03-20 17:06 245K 
[   ]Azobenzene photomechanics: prospects and potential applications.pdf2013-08-13 08:02 871K 
[   ]Characterization of optical properties of SU-8 and fabrication of optical components.pdf2009-10-26 21:59 1.1M 
[   ]Ciba catalog - Photoinitiators for UV curing - 2005.pdf2007-04-08 07:33 128K 
[   ]Comparative assessment of different sacrificial materials for releasing SU-8 structures.pdf2012-02-13 13:42 274K 
[   ]Design and syntheses of photoactive polymer systems capable of chemical amplification.pdf2012-12-20 23:07 4.4M 
[   ]Development of inorganic resists for electron beam lithography: novel materials and simulations.pdf2007-06-13 08:46 4.2M 
[   ]Direct laser writing of surface reliefs in dry, self-developing photopolymer films.pdf2006-10-26 01:24 73K 
[   ]Influence of photo-initiator concentration on residual mechanical stress in SU-8 thin films.pdf2012-06-27 13:47 529K 
[   ]Light-induced nanostructure formation using azobenzene polymers.pdf2011-12-28 18:25 831K 
[   ]Molded biocompatible and disposable PDMS SU-8 inket dispenser.pdf2013-09-13 01:55 869K 
[   ]Molecular resists for advanced lithography-design, synthesis, characterization, and simulation.pdf2011-09-19 08:09 8.1M 
[   ]Nanolithography made from water-based spin-coatable LSMO resist.pdf2006-08-27 09:00 1.3M 
[   ]Novel resist materials for next generation lithography.pdf2014-06-12 23:55 11M 
[   ]Photoinitiated polymerization: advances, challenges, and opportunities - 2010.pdf2014-06-12 18:00 4.1M 
[   ]Polymers for microelectronics - 1993.pdf2011-05-13 19:08 600K 
[   ]Progress in EUV resist development - 2007.pdf2007-12-02 20:00 441K 
[   ]Reducing SU-8 hygroscopic swelling by ultrasonic treatment.pdf2012-10-16 19:41 427K 
[   ]Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law.pdf2014-06-12 23:41 789K 
[   ]SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography.pdf2010-09-23 00:57 1.1M 
[   ]SU-8 photolithography and its impact on microfluidics.pdf2014-06-12 23:33 9.4M 
[   ]Straight SU-8 pins.pdf2012-06-15 14:40 1.0M 
[   ]Use of photoresists in the electronics industry (slides).pdf2007-08-19 10:35 2.9M 
[   ]Water-assisted formation of micrometer-size honeycomb patterns of polymers.pdf2014-06-13 00:03 648K 
[DIR]datasheets/2014-06-13 20:32 -  
[TXT]get.txt2014-06-13 15:17 2.0K 
[TXT]materials.txt2014-06-13 20:32 7.4K 
[TXT]notes.txt2014-06-13 00:17 1.4K 
[TXT]some-potoresists.html2014-06-13 15:40 44K 
[TXT]su8.html2014-06-12 22:48 85K 
[TXT]su8faq.html2014-06-13 15:43 37K 
[TXT]url.txt2014-06-13 15:43 1.9K 

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