From: Doug Bailey (Doug.Bailey@ey.com)
Date: Tue Dec 01 1998 - 07:38:43 MST
Scientists at IBM Watson have come up with an alternative to
the electron, ion and X-ray lithography techniques that have
been proposed to print integrated circuits. Hot-electron
emission lithography is the basis for a projection system
that can print 160 nm lines on an entire wafer in an e-beam
resist.
"Nanotech Research Ratchets Up a Notch at IBM", EET 11/30/98
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